Optoelectrical Properties of Ge-based Photodetectors with Graphene

Optoelectrical Properties of Ge-based Photodetectors with Graphene

Zagarzusem Khurelbaatar

Autore: Zagarzusem Khurelbaatar
Formato: Copertina flessibile
Pagine: 220
Data Pubblicazione: 2018-07-19
Edizione: 1
Lingua: English

Descrizione:
Due to physical limitation and manufacturing complexity of Si, it is becoming clear that alternative device structure or new materialbased technologies are vital to satisfy near future requirements for semiconductor industry. Ge photodetectors fabricated on Si substrate have recently great interest because Ge absorbs light in the infrared wavelengths (1310 nm1550 nm) and they could be monolithically integrated with Sibased CMOS technology. However, conventional epitaxial Ge growth on Si requires careful processing to minimize the impact of the dislocations caused by the lattice mismatch (4.2%) and large thermal expansion coefficient difference between Ge and Si. The superior flexibility and abundance of carbon source at low costs make graphene as a transparent conducting electrode, antireflection coating and current spreading films in numerous applications such as flexible solar cell, touch screen, light emitting diode and liquid crystal displays. The objective of this dissertation is to develop novel GeonSi based infrared photodetectors with transparent conductive graphene layer and investigate its optoelectric properties.