GeneralDescription

The MNT-JS1600M is a compact magnetron plasma sputter coating system, designed for cold and fast deposition of metal materials, such as Au, Ag, and Pt. It is an ideal tool for coating conductive gold deposition on thin polymer film and fabrication of electrodes on non-conductive substrate. It is equipped with a 50mm sputtering head and height adjustable sample platform.

Enabled by both magnetic field and electric field, the Magnetron sputter coating system presents significantly faster metal deposition rate. SEM sample surface can become conductive in as short as 10-20S. There will be no noticeable temperature increase on the samples to be coated for SEM or other purposes.

The magnetron plasma sputtering coating system includes one sputtering head with gold sputtering target installed (gold cathode), a two stage Vacuum pump, a bellow of translucent rubber with steel lining, KF 25 flange, and a vapor trap.

This product is manufactured in Canada according to US and Canada standard (110V/60Hz). Free shipping from Canada. Custom clearance and duties are included in the price when applicable. Two-year warranty and lifetime support are offered for this product.

MicroNano Tools provides various sputter targets for plasma sputter coater. Please click here for details.   


Specifications

Sputter Coater

Input power

110V, 60 HZ or 208-240V, 50HZ

Vacuum chamber

ID: 160 MM; Height: 110 mm 

Target (upper electrode)

Diameter: 50mm; standard thickness: 0.1mm, customizable

Sputtering area

Diameter: 50 mm

Gas atmosphere in Chamber

Ar or Nitrogen ready   for better plasma coating results 

Working vacuum

2×10-1~8×10-2 mbar

Max voltage

-1600 DVC

Max current

100 mA

Timer

Maximum  3600S

Overall dimension

360mm x 300mm x 380mm, suitable for glove box

Argon/Nitrogen fitting

OD: 4mm, already installed with screw, to be connected with the needle valve on main unit

Vacuum pump

 

Input power

AC 110V/60HZ 400W, Optional for 220/50HZ

Displacement speed  

For 60HZ; 1.3L/S (4.8M3/h)

for 50HZ 1.1L/S (4M3/h)

Max vacuum:

≤ 5X10-2 Pa

Noise

≤ 52dB

Control

Integrated with the main unit or stand alone

Flange

KF25, Adapters available upon request

 
Features

  • Enabled by both magnetic field and electric field, the Magnetron sputter coating system presents significant faster metal deposition rate
  • Cold sputter system, result in no noticeable temperature increase of sample
  • Compact size and robust design with big sputtering area
  • Built in sample sputtering chamber vacuum gauge and sputtering ampere meter, to indicate and monitor instrument condition
  • Adjustable sputtering current, enabling sputtering coating of various metals, such as gold, platinum, Indium and silver etc.
  • Hinge clamps are used for all vacuum connections to prevent vacuum leak
  • Possible to be used inside a standard glove box
  • Possible to be customized to 75 mm sample

Warranty

- Two-year standard warranty; life-time support; return accept at its original condition in 14 days;
- Damage due to improper storage condition, operation, or maintenance are not covered by warranty;
- Longer time warranty available upon request

Partial List of Our Clients

Magneto Innovations, The Citadel, The Military College of South Carolina, Gannon University, Flux GmbH from Germany, Chroma Color Corporation, Intecs Instrumentación S. A. de C.V. from Mexico, Amastan Technologies, University of Central Florida, Tufts University, Johns Hopkins University, 4C air in California, Impulse Dynamics Inc., IMR From Mexico, University of Western Ontario, Boeing Company, University of Waterloo, Calgary University, IBC Materials & Technologies, Virginia Tech, Idaho National Lab, Virginia Tech, Western Michigan University, OSC Japan, Pacific Northwest National Laboratory, University of Maryland in Baltimore County, University of the District of Columbia, Suncor Energy, Kansas State University, Blue Leaf Development, Alabama University, Meredith College, Suntricity Corporation, Buffalo University, Centre National Des Recherche en Sciences Tunisie, Clemson University, CNRS ARTEMIS in France, Begs Solutions, Systron Donner, Blue Leaf Development, Lehigh University, Zappe Inc., Innovative Ink GmbH in Germany, Techno Lab in Greek. References available upon request.


Additional Notes

1. In stock. Lead time of 110V/60HZ is 3-5 business days; The 220V/50Hz sputtering coater may take 5-10 business days longer; 
2. Product is manufactured in Canada, free shipping to clients US and Canada. Two-year warranty and lifetime support. 
3. Automatic payment term of net 30 days for universities and research institutes. No payment before receiving the plasma sputter coater. No worry. No stress. 
4. Free shipping for US and Canada using DHL, duty and custom clearance are all included in the price when applicable; No hidden fee. 
5. Accept custom OEM if there are any special requirements for your application